半导体工艺中OVL是什么，OVL measurement指什么？ - 知乎
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所以套刻精度要求非常高，尤其是线宽要求越来越高之后，精度的要求也越来越高。 光刻工艺 出大问题，三分之一是套刻的问题。 剩下的三分之一是CD和focus的问题，再剩下的就是各种 defect 了。
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